Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2003-05-13
2009-08-11
Hoang, Quoc D (Department: 2892)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C257S002000, C257S004000, C257SE21613
Reexamination Certificate
active
07572666
ABSTRACT:
A method comprising forming a first dielectric layer over an electrode formed to a first contact point on a substrate, the electrode having a contact area; patterning the first dielectric layer into a body, a thickness of the first dielectric layer defining a side wall; forming at least one spacer along the side wall of the first dielectric body, the at least one spacer overlying a portion of the contact area; forming a second dielectric layer on the contact area; removing the at least one spacer; and forming a material comprising a second contact point to the contact area. An apparatus comprising a volume of programmable material; a conductor; and an electrode disposed between the volume of programmable material and the conductor, the electrode having a contact area coupled to the volume of programmable material.
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U.S. Appl. No. 09/895,020, filed Jun. 30, 2001, to Chien Chiang et al.
Chow Jenn C.
Dennison Charles H.
Patel Kanaiyalal Chaturbhai
Wang Alice T.
Hoang Quoc D
Trop Pruner & Hu P.C.
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