Recycling of large-size photomask substrate

Details Recycling of large-size photomask substrate Recycling of large-size photomask substrate

2011-03-15

2011-03-15

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C451S038000

Reexamination Certificate

active

07906256

ABSTRACT:
A used large-size photomask substrate having a patterned light-shielding film is recycled by (i) removing the light-shielding film from the used substrate to provide a photomask-forming glass substrate stock, (ii) resurfacing the glass substrate stock by sand blasting, (iii) repolishing the resurfaced glass substrate stock to yield a regenerated glass substrate stock, (iv) applying a light-shielding film onto the regenerated glass substrate stock to yield a regenerated photomask-forming blank, and (v) processing the light-shielding film of the blank into a pattern corresponding to a desired exposure of a mother glass, yielding a regenerated photomask substrate.

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European Search Report issued on Sep. 13, 2010 in corresponding European Patent Application No. 07 25 4871.

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