Recycling of gases for an excimer laser

Coherent light generators – Particular active media – Gas

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372 57, 372 60, H01S 322

Patent

active

046740996

ABSTRACT:
For an excimer laser system utilizing in a laser chamber a lasing material and a mixture of a diluent rare gas and a heavy rare gas and halogen rare gas in given percentages there is disclosed a method and apparatus for reducing the expenditure of the rare gases by continuously evacuating the laser mixture from the laser chamber removing from the evacuated laser mixture any foreign halogen compounds to provide a cleaned laser mixture and thereafter feeding the cleaned lasing mixture back into the laser chamber. Along with the cleaned laser mixture there is fed in a supplementing lasing material which is a mixture of the halogen gas, the diluent gas and the heavy rare gas. The percentage of the halogen gas in the supplemental material is substantially greater than the given percentage in the lasing chamber while the percentages of the diluent gas and the heavy rare gas are substantially the same as the percentage ratios of the given percentages. To prevent laser system pressure from changing as the supplemental material is added to the system there is disclosed a method for venting the lasing material to maintain constant laser system pressure.

REFERENCES:
patent: 3566304 (1971-02-01), Neusel et al.
patent: 3648194 (1972-03-01), Melikian et al.
patent: 3876957 (1975-04-01), Thatcher
patent: 4417340 (1983-11-01), Horiuchi et al.
patent: 4514698 (1985-04-01), Blumenthal et al.
Johnson et al; "A Closed-Cycle Gas Recirculating System for Rare-Gas Halide Excimer Lasers"; Appl. Phys. Lett., 32(5), Mar. 1, '78.
Fradin et al; "A Recirculating, Self-Contained DF/HF Pulsed Laser"; IEEE JQE, 11(3), Part 1, p. 631, Aug. 1975.
Christensen; High-Repetition-Rate XeF Laser with Gas Recycling"; Appl. Phys. Lett., vol. 30, No. 9, May 1, 1972.

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