Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1995-12-22
1998-11-24
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
20419213, 20429803, 20429841, 118723VE, 427580, 250426, 31511181, C23C 1432
Patent
active
058401636
ABSTRACT:
A rectangular vacuum-arc plasma source and associated apparatus for generating and directing a stream of plasma containing an ionized vapor of a cathode material toward a substrate by vacuum arc evaporation of a rectangular planar cathode mounted in a rectangular plasma duct. The rectangular duct conducts the plasma from the cathode to the substrate region, while intercepting the molten droplets of cathode material also generated by the arc. Magnets control the arc motion on the cathode surface while simultaneously generating the magnetic field which guides the plasma through the duct. Benefits of a filtered cathodic arc (fully ionized vapor stream, elimination of splattered droplets) are combined with the benefits of a rectangular source (uniform evaporation from the source and uniform deposition on the substrate using linear motion). The rectangular source may be extended indefinitely in length, thus allowing coating or ion implantation on large or long substrates.
REFERENCES:
patent: 484582 (1892-10-01), Edison
patent: 2972695 (1961-02-01), Wroe
patent: 3612937 (1971-10-01), Smirnov et al.
patent: 3625848 (1971-12-01), Snaper
patent: 3783231 (1974-01-01), Sablev et al.
patent: 3793179 (1974-02-01), Sablev et al.
patent: 3836451 (1974-09-01), Snaper
patent: 4092516 (1978-05-01), Martin
patent: 4109922 (1978-08-01), Martin
patent: 4220889 (1980-09-01), Marhic et al.
patent: 4452686 (1984-06-01), Axenov et al.
patent: 4492845 (1985-01-01), Kljuchko et al.
patent: 4551221 (1985-11-01), Axenov et al.
patent: 4587432 (1986-05-01), Aitken
patent: 4609564 (1986-09-01), Pinkhasov
patent: 4645895 (1987-02-01), Boxman et al.
patent: 4673477 (1987-06-01), Ramalingam et al.
patent: 4724058 (1988-02-01), Morrison, Jr.
patent: 4849088 (1989-07-01), Veltrop et al.
patent: 4859489 (1989-08-01), Pinkhasov
patent: 5037522 (1991-08-01), Vergason
patent: 5269898 (1993-12-01), Welty
patent: 5279723 (1994-01-01), Falabella et al.
patent: 5282944 (1994-02-01), Sanders et al.
patent: 5298136 (1994-03-01), Ramalingam
patent: 5433836 (1995-07-01), Martin et al.
patent: 5435900 (1995-07-01), Gorakhovsky
patent: 5468363 (1995-11-01), Falabella
Aksenov et al., "Transport of Plasma Streams in a Curvilinear Plasma-Optics System," Soviet Journal of Plasma Physics, 4(4), Jul.-Aug. 1978.
Breneman R. Bruce
McDonald Rodney G.
Vapor Technologies Inc.
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