Rectangular filtered arc plasma source

Details Rectangular filtered arc plasma source Rectangular filtered arc plasma source

1999-04-14

1999-12-07

Diamond, Alan

Chemistry: electrical and wave energy

Apparatus

Vacuum arc discharge coating

20429808, 20429814, 20429817, 20429802, 20429811, 20419238, 20419212, C23C 1432

Patent

active

059977051

ABSTRACT:
An apparatus is disclosed for generating oppositely directed streams of plasma for the purpose of depositing a coating or performing ion processing. The plasma comprises ionized vapor of a cathode material, generated by vacuum arc evaporation from a linear magnetron cathode. The plasma is diverted by a deflection electrode to a substrate region, while the macroscopic droplets of cathode material also generated by the arc are intercepted and prevented from reaching the substrate. Magnetic means are disclosed for controlling the arc motion on the cathode surface while simultaneously deflecting and guiding the plasma. The source may be extended indefinitely in length, permitting coating or ion processing of large substrates.

REFERENCES:
patent: 3783231 (1974-01-01), Sablev et al.
patent: 3793179 (1974-02-01), Sablev et al.
patent: 4031424 (1977-06-01), Penfold et al.
patent: 4116806 (1978-09-01), Love et al.
patent: 4194962 (1980-03-01), Cambers et al.
patent: 4404077 (1983-09-01), Fournier
patent: 4428259 (1984-01-01), Kubo et al.
patent: 4430184 (1984-02-01), Mularie
patent: 4448659 (1984-05-01), Morrison, Jr.
patent: 4452686 (1984-06-01), Axenov et al.
patent: 4486289 (1984-12-01), Parsons et al.
patent: 4492845 (1985-01-01), Kluchko et al.
patent: 4515675 (1985-05-01), Kieser et al.
patent: 4559121 (1985-12-01), Mularie
patent: 4581118 (1986-04-01), Class et al.
patent: 4600489 (1986-07-01), Lefkow
patent: 4717968 (1988-01-01), Painton et al.
patent: 4749587 (1988-06-01), Bergmann et al.
patent: 4801217 (1989-01-01), Goldberg
patent: 4812217 (1989-03-01), George et al.
patent: 4849088 (1989-07-01), Veltrop et al.
patent: 4933064 (1990-06-01), Geisler et al.
patent: 4994164 (1991-02-01), Bernardet
patent: 5133850 (1992-07-01), Kukla et al.
patent: 5160585 (1992-11-01), Berg
patent: 5262028 (1993-11-01), Manley
patent: 5266178 (1993-11-01), Sichmann
patent: 5269898 (1993-12-01), Welty
patent: 5277778 (1994-01-01), Daube et al.
patent: 5277779 (1994-01-01), Henshaw
patent: 5279723 (1994-01-01), Falabella et al.
patent: 5282944 (1994-02-01), Sanders et al.
patent: 5317235 (1994-05-01), Treglio
patent: 5364518 (1994-11-01), Hartig et al.
patent: 5380421 (1995-01-01), Gorokhovsky
patent: 5387326 (1995-02-01), Buhl et al.
patent: 5403457 (1995-04-01), Nago et al.
patent: 5404017 (1995-04-01), Inuishi et al.
patent: 5433836 (1995-07-01), Martin et al.
patent: 5433838 (1995-07-01), Martin et al.
patent: 5435900 (1995-07-01), Gorokhovsky
patent: 5451308 (1995-09-01), Sablev et al.
patent: 5480527 (1996-01-01), Welty
patent: 5482611 (1996-01-01), Helmer et al.
patent: 5512156 (1996-04-01), Yamanishi et al.
patent: 5518597 (1996-05-01), Storer et al.
patent: 5531877 (1996-07-01), Latz et al.
patent: 5587207 (1996-12-01), Gorokhovsky
patent: 5589039 (1996-12-01), Hsu
patent: 5597459 (1997-01-01), Atshuler
patent: 5730847 (1998-03-01), Hanaguri et al.
patent: 5804041 (1998-09-01), Hurwitt
patent: 5840163 (1998-11-01), Welty

Affiliated with

Also associated with

Rating

Rectangular filtered arc plasma source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rectangular filtered arc plasma source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rectangular filtered arc plasma source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-819808