Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1978-10-23
1980-07-22
Cooper, Jack
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423332, 423483, 423484, 423490, C01B 3312, C01B 722, C01D 302
Patent
active
042139511
ABSTRACT:
Hydrofluoric acid is recovered from fluosilicic acid by reacting fluosilicic acid with sodium hydroxide to form a first slurry having a pH of from about 11 to about 14, the first slurry containing sodium metasilicate and precipitated sodium fluoride. Sodium fluoride is recovered from the first slurry leaving a first solution which is reacted with sodium fluosilicate or fluosilicic acid or both to form a second slurry comprising silica and dissolved sodium fluoride. The reaction occurs under such conditions that the second slurry contains precipitated amorphous silica. The precipitated amorphous silica is separated from the second slurry leaving a second solution of sodium fluoride. Sodium fluoride is recovered from the second solution. Recovered sodium fluoride is reacted with sulfuric acid to produce hydrogen fluoride.
REFERENCES:
patent: 3061541 (1962-10-01), Henry
patent: 3278265 (1966-10-01), Quarles
patent: 3506394 (1970-04-01), Okamura et al.
patent: 3537817 (1970-11-01), Bacheland
patent: 3549317 (1970-12-01), Dorn et al.
patent: 3689216 (1972-09-01), Brown
patent: 3755532 (1973-08-01), Harrison et al.
patent: 3878294 (1975-04-01), Schabacher et al.
patent: 3914398 (1975-10-01), Faust
Moore James H.
Sikdar Subhas K.
Bisson Barry A.
Cooper Jack
Occidental Research Corporation
LandOfFree
Recovery of hydrofluoric acid from fluosilicic acid with high pH does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Recovery of hydrofluoric acid from fluosilicic acid with high pH, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Recovery of hydrofluoric acid from fluosilicic acid with high pH will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2178237