Recovery of gadolinium and gallium oxides

Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Rare earth metal

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423122, 423127, 423132, 423111, C01F 1700, C01G 1500

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active

044055684

ABSTRACT:
A process is described whereby the "saw kerf" can be reprocessed in sufficient purity to be re-used in the process, thereby improving the economics of production of GGG wafers significantly. Gadolinium and gallium oxides are recovered and separated from transition metal impurities introduced during fabrication of GGG wafers. The process "saw kerf" produced from slicing the crystal boule is dissolved by refluxing in HNO.sub.3, treated with oxalic acid and the resulting oxalates and nitrates separated. Pyrolysis of these salts at temperatures of at least 850.degree. C. resulted in their conversion to Ga.sub.2 O.sub.3 of purity >99.99%. The process can be extended to include purification and re-use of by-products generated in other grinding and polishing operations which may result in the recycling of the order of 80% of the generated by-products.

REFERENCES:
patent: 3506585 (1970-04-01), Otsuka et al.
patent: 4094753 (1978-06-01), Charlton et al.
patent: 4198231 (1980-04-01), Gusset
patent: 4375453 (1983-03-01), Nalewajek et al.
02599 D/03, Rhone-Poulenc Industries.
45734 B/25, Schweizerische Alum.
Schultze et al., "Chemical Absts.", vol. 85, 1976, #66231n.

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