Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1979-07-20
1981-09-08
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
346 76R, 346 77E, 427 531, 427 55, 427160, 428913, 430270, 430294, 430321, 430330, 430348, 430293, 430964, G03C 500, G03C 524
Patent
active
042885094
ABSTRACT:
A recording material comprising a transparent support having formed thereon a recording layer containing a thermally coagulatable proteinaceous compound, the recording layer having an average optical density throughout the wavelength region of about 350 mm to 450 nm of at least about 1.5 is disclosed, which is suitable for preparing a reprographic material such as a photmask by flash exposure in heat conducting relation with an original.
REFERENCES:
patent: 3514597 (1970-05-01), DeHaes et al.
patent: 3609360 (1971-09-01), Wiese
patent: 3642475 (1972-02-01), Urancken et al.
patent: 3645204 (1972-02-01), Gosnell
patent: 3698902 (1972-10-01), Gaspar
patent: 3952132 (1976-04-01), Kato et al.
patent: 4115613 (1978-09-01), Inove et al.
Kosar, Light-Sensitive Systems, Feb. 1966, pp. 55262.
Kimlin Edward C.
Process Shizai Co., Ltd.
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