Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-05-29
1999-11-23
Nguyen, Nam
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 19, 430 20, G03F 900
Patent
active
059897520
ABSTRACT:
A reconfigurable mask for forming erasable patterns is disclosed. The mask includes material having optical properties manipulated by nonphysical means. In a preferred embodiment, the mask includes a liquid crystal array formed by materials that are transparent to the exposure light. A phase-shift mask can also be formed by controlling the refractive index of each cell. The mask can be used to form mask patterns that compensate for overexposure at corners of a mask pattern.
REFERENCES:
patent: 2629956 (1953-03-01), Switzer
patent: 4013466 (1977-03-01), Klaiber
patent: 4229520 (1980-10-01), Bratt et al.
patent: 4828947 (1989-05-01), Sato et al.
patent: 4837097 (1989-06-01), Narang et al.
patent: 4847183 (1989-07-01), Kruger
patent: 5045419 (1991-09-01), Okumura
patent: 5135609 (1992-08-01), Pease et al.
patent: 5189549 (1993-02-01), Leventis et al.
patent: 5302477 (1994-04-01), Dao et al.
patent: 5334467 (1994-08-01), Cronin et al.
patent: 5389474 (1995-02-01), Iguchi et al.
patent: 5415951 (1995-05-01), Miyazaki
patent: 5442184 (1995-08-01), Palmer et al.
patent: 5444330 (1995-08-01), Leventis et al.
patent: 5624773 (1997-04-01), Pforr et al.
Coates, David, "Smectic A LCDs".
Chopra, K.L. et al., "Transparent Conductors--A Status Review", Thin Solid Films, 102 (1983) 1-46, Electronics And Optics.
Nguyen Nam
VerSteeg Steven H.
LandOfFree
Reconfigurable mask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Reconfigurable mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reconfigurable mask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1219702