Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1987-06-22
1989-07-18
Fields, Carolyn E.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
2504923, 250397, 250398, G01N 2300
Patent
active
048496413
ABSTRACT:
A non-destructive ion dose monitor senses instantaneous dose increment in respect of a secondary radiation from known instantaneous coordinates of the ion beam, and a dose image distribution function of workpiece surface coordinates is accumulated in a memory. At intervals, the dose image is compared with a preselected desired dose distribution to obtain a difference distribution function of the ion beam scanning coordinates. The subsequent scanning regime is altered in accord with the difference distribution to cause the sensed dose image to converge with the desired distribution.
REFERENCES:
patent: 4110625 (1978-08-01), Cairns et al.
patent: 4283631 (1981-08-01), Turner
patent: 4449051 (1984-05-01), Berkowitz
patent: 4500790 (1985-02-01), Bretscher et al.
patent: 4517465 (1985-05-01), Gault et al.
patent: 4593200 (1986-06-01), McGuire
patent: 4683378 (1987-07-01), Shimase et al.
patent: 4743767 (1988-05-01), Plumb et al.
patent: 4751393 (1988-06-01), Corey, Jr. et al.
patent: 4761559 (1988-08-01), Myron
Hammer and Michel, Journal of Applied Physics, vol. 47, pp. 2161-2164, (1976).
Fine and Gordon, Nuclear Instruments and Methods, vol. 149, pp. 679-683, (1978).
Natsuaki, et al., Review of Scientific Instruments, vol. 49, pp. 1300-1304, (1978).
Szajmowski, Vacuum, vol. 34, pp. 285-289, (1984).
Berkowitz Edward H.
Fields Carolyn E.
Miller John A.
LandOfFree
Real time non-destructive dose monitor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Real time non-destructive dose monitor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Real time non-destructive dose monitor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-174237