Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element
Reexamination Certificate
2005-08-02
2005-08-02
Zarneke, David (Department: 2829)
Electricity: measuring and testing
Fault detecting in electric circuits and of electric components
Of individual circuit component or element
Reexamination Certificate
active
06924657
ABSTRACT:
An apparatus and method for the real-time, in-line testing of semiconductor wafers during the manufacturing process. In one embodiment the apparatus includes a probe assembly within a semiconductor wafer processing line. As each wafer passes adjacent the probe assembly, a source of modulated light, within the probe assembly, having a predetermined wavelength and frequency of modulation, impinges upon the wafer. A sensor in the probe assembly measures the surface photovoltage induced by the modulated light. A computer then uses the induced surface photovoltage to determine various electrical characteristics of the wafer.
REFERENCES:
patent: 3850508 (1974-11-01), Sittig et al.
patent: 4393348 (1983-07-01), Goldstein et al.
patent: 4498772 (1985-02-01), Jastrzebski et al.
patent: 4544887 (1985-10-01), Kemieniecki
patent: 4563642 (1986-01-01), Munakata et al.
patent: 4567431 (1986-01-01), Goodman
patent: 4598249 (1986-07-01), Goodman et al.
patent: 4642565 (1987-02-01), Jastrzebski et al.
patent: 4758786 (1988-07-01), Hafeman
patent: 4841239 (1989-06-01), Foell et al.
patent: 4902967 (1990-02-01), Flesner
patent: 4956603 (1990-09-01), Russo
patent: 4963815 (1990-10-01), Hafeman
patent: 5025145 (1991-06-01), Lagowski
patent: 5091691 (1992-02-01), Kamieniecki et al.
patent: 5114171 (1992-05-01), D'Antonio
patent: 5177351 (1993-01-01), Lagowski
patent: 5216362 (1993-06-01), Verkuil
patent: 5369495 (1994-11-01), Lagowski
patent: 5418172 (1995-05-01), Falster et al.
patent: 5485091 (1996-01-01), Verkuil
patent: 5511005 (1996-04-01), Abbe et al.
patent: 5581194 (1996-12-01), Lowell
patent: 5644223 (1997-07-01), Verkuil
patent: 5661408 (1997-08-01), Kamieniecki et al.
patent: 5663657 (1997-09-01), Lagowski et al.
patent: 5708365 (1998-01-01), Yoshino et al.
patent: 5773989 (1998-06-01), Edelman et al.
patent: 5804981 (1998-09-01), Lowell et al.
patent: 5907764 (1999-05-01), Lowell et al.
patent: 5943552 (1999-08-01), Koveshnikov et al.
patent: 5966019 (1999-10-01), Borden
patent: 5977788 (1999-11-01), Lagowski
patent: 5994911 (1999-11-01), Ozaita-Mintegui et al.
patent: 6011404 (2000-01-01), Ma et al.
patent: 6037797 (2000-03-01), Lagowski et al.
patent: 6069017 (2000-05-01), Kamieniecki et al.
patent: 6097196 (2000-08-01), Verkuil et al.
patent: 6114865 (2000-09-01), Lagowski et al.
patent: 6166354 (2000-12-01), Hause et al.
patent: 6202029 (2001-03-01), Verkuil et al.
patent: 6265890 (2001-07-01), Chacon et al.
patent: 6315574 (2001-11-01), Kamieniecki et al.
patent: 6325078 (2001-12-01), Kamieniecki
patent: 6326220 (2001-12-01), Chen et al.
patent: 6388455 (2002-05-01), Kamieniecki et al.
patent: 6489776 (2002-12-01), Stowe et al.
patent: 6512384 (2003-01-01), Lagowski et al.
patent: 6522158 (2003-02-01), Fung et al.
patent: 6538462 (2003-03-01), Lagowski et al.
patent: 6569691 (2003-05-01), Jastrzebski et al.
patent: 6597193 (2003-07-01), Lagowski et al.
patent: WO 01/86698 (2001-11-01), None
“Monitoring of Heavy Metal Contamination during Chemical Cleaning with Surface Photovoltage,” by L. Jastrzebski et al., J. Electrochem. Soc., vol. 140, No. 4, Apr. 1993, pp. 1152-1159.
QCS Application Note 1001—“Epi Overdoping Detection Using Surface Charge Profiler,” QC Solutions, Inc., (date unavailable).
QCS Application Note 1002—“QCS-7200 and Product Wafers,” QC Solutions, Inc., (date unavailable).
QCS 7000 “Epitaxial Process Control System”, QC Solutions, Inc., (date unavailable).
Kamieniecki Emil
Ruzyllo Jerzy
Hollington Jermele
Kirkpatrick & Lockhart
Nicholson Graham LLP
QC Solutions, Inc.
Zarneke David
LandOfFree
Real-time in-line testing of semiconductor wafers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Real-time in-line testing of semiconductor wafers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Real-time in-line testing of semiconductor wafers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3453081