Real time-determination of interconnect metrology using binary c

Details Real time-determination of interconnect metrology using binary c Real time-determination of interconnect metrology using binary c

1996-10-22

1999-08-17

Nguyen, Thong

Optical: systems and elements

Holographic system or element

Using a hologram as an optical element

359 9, 359572, 356354, G02B 532, G02B 518, G03H 108, G01B 902

Patent

active

059401940

ABSTRACT:
Holographic test structures on a semiconductor wafer are used to provide real-time analysis of upstream fabrication processing parameters. The test structures comprise reflective segments within multiple cells on the test structure. The size and placement of the reflective segments within the cells are determined by diffraction theory in such a way that a desired image is projected from the test structure. The intensity, sharpness, and shape of the image is used as a direct measure of the upstream fabrication process parameters.

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