Real time analysis of periodic structures on semiconductors

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Chemical analysis

Reexamination Certificate

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C702S028000, C702S159000, C356S625000

Reexamination Certificate

active

07031848

ABSTRACT:
A system for characterizing geometric structures formed on a sample on a real time basis is disclosed. A multi-parameter measurement module generates output signals as a function of either wavelength or angle of incidence. The output signals are supplied to a parallel processor. The processor creates an initial theoretical model and then calculates the theoretical optical response of that sample. The calculated optical response is compared to measured values. Based on the comparison, the model configuration is modified to be closer to the actual measured structure. The processor recalculates the optical response of the modified model and compares the result to the measured data. This process is repeated in an iterative manner until a best fit is achieved. The steps of calculating the optical response of the model is distributed to the processors as a function of wavelength or angle of incidence so these calculations can be performed in parallel.

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“Why create libraries? Now you can perform in real-time” advertisement, Therma-Wave, one page, no date.
Opsal et al., “Fundamental solutions for real-time optical CD metrology,”Metrology, Inspection, and Process Control for Microlithography XVI, Proceedings of SPIE,vol. 4689 (2002), Mar. 4-7, 2002, pp. 163-176.

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