1987-03-03
1988-05-31
Carroll, J.
357 2314, 357 41, 357 45, 357 54, 357 71, H01L 2978, H01L 2702, H01L 2934, H01L 2348
Patent
active
047484926
ABSTRACT:
A MOSFET read only memory is disclosed. A silicon material directly contacts a drain of a memory cell transistor formed in a silicon substrate to obtain a low contact resistance. A drain electrode layer partially covers two oxide films which are above a gate electrode, to increase a contact area between a metal wiring layer constituting an output line and the drain electrode layer.
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Ariizumi Shoji
Iwase Taira
Masuoka Fujio
Carroll J.
Kabushiki Kaisha Toshiba
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