Gas: heating and illuminating – Apparatus for converting or treating hydrocarbon gas
Reexamination Certificate
2006-12-27
2010-12-21
Ruddock, Ula C (Department: 1795)
Gas: heating and illuminating
Apparatus for converting or treating hydrocarbon gas
C048S061000, C422S130000, C422S187000, C422S186220, C429S400000
Reexamination Certificate
active
07854776
ABSTRACT:
A reactor causing reaction of a reactant includes a plurality of substrates provided with top and bottom substrates having provided therein recessed portions for forming closely sealed regions and a plurality of intermediate substrates having provided therein at least openings that communicate with each other, a reactor main body portion including a reaction unit at which the intermediate substrates are formed to be laminated and joined with each other and a reaction flow channel reactant flows formed therein, and an envelope portion which houses the reactor main body portion therein except one end side thereof, via a closely sealed space formed by sandwiching the laminated intermediate substrates between the top and the bottom substrates and by communicating the opening and the closely sealed region on the substrates, and including a support portion which supports the reactor main body portion via the one end side of the reactor main body portion.
REFERENCES:
patent: 7531016 (2009-05-01), Yamamoto et al.
patent: 2004/0244290 (2004-12-01), Yamamoto et al.
patent: 2005/0244685 (2005-11-01), Kim et al.
patent: 2001-50160 (2001-02-01), None
patent: 2003-48702 (2003-02-01), None
patent: 2005-126286 (2005-05-01), None
patent: 2005-270727 (2005-10-01), None
patent: 2005-314207 (2005-11-01), None
patent: 226721 (2005-01-01), None
patent: 228844 (2005-03-01), None
patent: 229013 (2005-03-01), None
Japanese Office Action dated Oct. 6, 2009 and English translation thereof issued in a counterpart Japanese Application No. 2005-378606.
Taiwanese Office Action dated Jun. 17, 2010 and English translation thereof, issued in counterpart Taiwanese Application No. 095149198.
Akram Imran
Casio Computer Co. Ltd.
Holtz Holtz Goodman & Chick PC
Ruddock Ula C
LandOfFree
Reactor including a plurality of substrates to form a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Reactor including a plurality of substrates to form a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reactor including a plurality of substrates to form a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4210516