Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
Reexamination Certificate
2007-01-16
2007-01-16
McDonald, Rodney G. (Department: 1753)
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
With means applying electromagnetic wave energy or...
C422S186290
Reexamination Certificate
active
10472207
ABSTRACT:
A plasma reactor (11) of the silent discharge or dielectric barrier type for treatment of a gaseous medium is provided with a layer of material (34) positioned to present a surface extending along at least part of the length of the gas flow path. Particulates or selected species are entrapped on the surface. A preferred electrode arrangement provides surface discharge in the plasma at the surface of the layer of material.
REFERENCES:
patent: 4276066 (1981-06-01), Bly
patent: 4427418 (1984-01-01), Kogiso
patent: 4485622 (1984-12-01), Takagi
patent: 4505107 (1985-03-01), Yamaguchi
patent: 4871515 (1989-10-01), Reichle et al.
patent: 5746051 (1998-05-01), Kieser
patent: 5914015 (1999-06-01), Barlow et al.
patent: 6517786 (2003-02-01), Best et al.
patent: 6767434 (2004-07-01), Imanishi et al.
patent: 0010384 (1980-04-01), None
patent: 0112634 (1984-07-01), None
patent: 0132166 (1985-01-01), None
patent: 0244061 (1987-11-01), None
patent: 2232613 (1990-12-01), None
patent: 2274412 (1994-07-01), None
patent: 99/20373 (1999-04-01), None
Cutler and Merkel, “A New High Temperature Ceramic Material for Diesel Particulate Filter Applications,” SAE 2000-01-2844, pp. 79-87.
Carlow John Sydney
Ng Ka Lok
Shawcross James Timothy
Accentus PLC
Holt William H.
McDonald Rodney G.
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