Reactor for chlorosilane compound

Details Reactor for chlorosilane compound Reactor for chlorosilane compound

2005-08-17

2010-06-01

Griffin, Walter D (Department: 1797)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

C422S198000, C118S724000, C118S725000

Reexamination Certificate

active

07727483

ABSTRACT:
In a reaction apparatus of the chlorosilanes for heating a reaction portion that is a section from the bottom end portion to a specified height in the carbon reaction vessel and that has an inside face to which silicon has deposited, and for reacting the chlorosilanes by making the chlorosilanes and hydrogen to come into contact with the inside face of the reaction portion, a gas penetration preventing processing for preventing the chlorosilanes supplied to the reaction vessel from penetrating a pipe wall of the non reaction portion in the reaction vessel is carried out to the inside face and/or the outside face of the non reaction portion on the side upper than the reaction portion in the reaction vessel.

REFERENCES:
patent: 4132763 (1979-01-01), Schmidt et al.
patent: 5126112 (1992-06-01), Burgie
patent: 5259856 (1993-11-01), Ohga et al.
patent: 7413718 (2008-08-01), Nakamura et al.
patent: 2002/0104474 (2002-08-01), Wakamatsu et al.
patent: 2007/0034146 (2007-02-01), Nakashima et al.
patent: 9-157073 (1997-06-01), None
patent: 2002-029726 (2002-01-01), None
patent: 2003-02627 (2003-01-01), None
patent: 2003002627 (2003-01-01), None
patent: 2003020217 (2003-01-01), None
patent: 2003-054933 (2003-02-01), None
patent: 2004-002138 (2004-01-01), None

Affiliated with

Also associated with

Rating

Reactor for chlorosilane compound does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reactor for chlorosilane compound, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reactor for chlorosilane compound will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4191204