Reactor device for free-flowing and higher-viscosity media

Details Reactor device for free-flowing and higher-viscosity media Reactor device for free-flowing and higher-viscosity media

1995-12-12

1998-07-14

Bhat, Nina

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Organic polymerization

422137, 422138, B01F 1500, B01F 702

Patent

active

057799865

ABSTRACT:
The reactor device comprises a horizontally-disposed housing (1), at one end of which there is disposed an inlet (4) for supply of the medium, and at the other end of which there is an outlet (5) for the reaction products. Within the housing (1) of the reactor device a rotor (1) is rotatably mounted. The rotor (8) has a hollow cylinder (9), which is provided with openings (10) and annular members (12, 13) for moving and transporting the medium. The hollow cylinder (9) is partly immersed in the free-flowing medium, the openings (10) in the hollow cylinder (9) ensuring additional admixture of the medium.

REFERENCES:
patent: 3118739 (1964-01-01), Atkinson et al.
patent: 3476523 (1969-11-01), Leybourne, III et al.
patent: 3591344 (1971-07-01), Schnock et al.
patent: 3595627 (1971-07-01), Abbott et al.
patent: 3619145 (1971-11-01), Crawford et al.
patent: 3634042 (1972-01-01), McCown
patent: 3706719 (1972-12-01), Goffinet, Jr.
patent: 3840509 (1974-10-01), Kajimoto et al.
patent: 3867104 (1975-02-01), Leybourne, III et al.
patent: 4343929 (1982-08-01), Sugiio et al.
patent: 5055273 (1991-10-01), Wilhelm et al.
patent: 5145255 (1992-09-01), Shimada et al.
patent: 5599507 (1997-02-01), Shaw et al.

Affiliated with

Also associated with

Rating

Reactor device for free-flowing and higher-viscosity media does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reactor device for free-flowing and higher-viscosity media, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reactor device for free-flowing and higher-viscosity media will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1879027