Reactor and process for the preparation of silicon

Details Reactor and process for the preparation of silicon Reactor and process for the preparation of silicon

2006-03-03

2010-02-09

Vanoy, Timothy C (Department: 1793)

Chemistry of inorganic compounds

Silicon or compound thereof

Elemental silicon

C423S349000, C422S139000, C422S143000

Reexamination Certificate

active

07658900

ABSTRACT:
In a reactor for the decomposition of a silicon-containing gas, provision is made, to avoid silicon deposition on an inner wall of a reactor vessel, for at least one catalytically active mesh to be provided within a reaction chamber between at least one gas feed line and the inner wall (4). The mesh accelerates the thermal decomposition of the gas and reduces the deposition of silicon on the inner wall. Also described is a process for the preparation of silicon using the reactor according to the invention and the use in photovoltaics of the silicon prepared.

REFERENCES:
patent: 4237150 (1980-12-01), Wiesmann
patent: 4314525 (1982-02-01), Hsu et al.
patent: 4341749 (1982-07-01), Iya et al.
patent: 4354987 (1982-10-01), Iya
patent: 4444811 (1984-04-01), Hsu et al.
patent: 4477277 (1984-10-01), D'Altilia et al.
patent: 4588571 (1986-05-01), Bildl et al.
patent: 4642227 (1987-02-01), Flagan et al.
patent: 4661335 (1987-04-01), Boudot et al.
patent: 4986971 (1991-01-01), Forwald et al.
patent: 5229102 (1993-07-01), Minet et al.
patent: 2003/0175196 (2003-09-01), Blackwell et al.
patent: 2004/0151652 (2004-08-01), Herold et al.
patent: 1 024 937 (1958-08-01), None
patent: 33 17 286 (1984-11-01), None
patent: 36 10 713 (1987-03-01), None
patent: 37 39 895 (1988-06-01), None
patent: 38 39 700 (1989-06-01), None
patent: 38 39 705 (1989-06-01), None
patent: 39 10 343 (1989-10-01), None
patent: 199 48 395 (2001-05-01), None
patent: 101 24 848 (2002-11-01), None
patent: 101 51 159 (2003-04-01), None
patent: 102004027564 (2005-12-01), None
patent: 102004027563 (2006-12-01), None
patent: 0 450 393 (1991-10-01), None
patent: 1 550 636 (2005-07-01), None
patent: WO 2004035472 (2004-04-01), None

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