Reactively sputtered chrome silicon nitride resistors

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

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204192R, 338308, 428195, C23C 1500

Patent

active

045697426

ABSTRACT:
Radio frequency sputtering of silicon and chromium alloy targets in a nitrogen and argon atmosphere while applying an electrical bias to the substrate produces an electrically resitive thin film on said substrate.

REFERENCES:
patent: 3477935 (1969-11-01), Hall
patent: 4392992 (1983-07-01), Paulson

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