Reactive sputtering of silicon and transition metal

Details Reactive sputtering of silicon and transition metal Reactive sputtering of silicon and transition metal

1992-11-25

2000-10-31

Turner, Archene

Stock material or miscellaneous articles

Composite

Of quartz or glass

428428, 428336, 428698, 428697, 428699, 428701, 428702, 428433, C03C 1740

Patent

active

061399698

ABSTRACT:
Low absorbance coatings of silicon-nickel alloy in the form of oxides, nitrides and oxynitrides are disclosed along with a method for producing them by sputtering silicon-nickel targets comprising 3 to 18 weight percent nickel in atmospheres comprising reactive gases such as nitrogen, oxygen and mixtures thereof which may further comprise inert gas such as argon. The presence of nickel in the range of 3 to 18 weight percent provides target stability and enhanced sputtering rates over target of silicon alone or alloyed with aluminum, while maintaining a low refractive index and low absorbance, not only when sputtering in oxygen to produce an oxide coating, but also when sputtering in nitrogen or a mixture of nitrogen and oxygen to produce coatings of silicon-nickel nitride or oxynitride respectively.

REFERENCES:
patent: 4450201 (1984-05-01), Brill et al.
patent: 4847157 (1989-07-01), Goodman et al.
patent: 4990234 (1991-02-01), Szczyrbowski et al.
patent: 4992087 (1991-02-01), Holscher
patent: 5170291 (1992-12-01), Szczyrbowski et al.
Properties of d.c. Magnetron Sputtered NiSiO.sub.x -Films by J. Szczyrbowski et al., SPIE vol. 1272, pp. 38-45, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion IX (1990).
Francois et al., "Reflectivity of ScN.sub.x Thin Films: Comparison with TiN.sub.x, TiN.sub.x C.sub.y and ZrN.sub.x Coatings and Application to the Photothermal Conversion of Solar Energy", Thin Solid Films, 127 (1985) pp. 205-214.
Valkonen et al., "Selective Transmission of Thin TiN-films", SPIE Int. Soc. Opt. Eng., 1983, pp. 375-380.

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