Reactive PVD with NEG pump

Details Reactive PVD with NEG pump Reactive PVD with NEG pump

1996-06-20

1998-07-14

Capossela, Ronald C.

Refrigeration

Low pressure cold trap process and apparatus

55569, 417901, B01D 800

Patent

active

057786828

ABSTRACT:
An apparatus for carrying out reactive physical vapor deposition on a substrate to form a nitride layer, comprises a vacuum chamber, a substrate support in the vacuum chamber, a target over the substrate support made of a refractory or noble metal, for example titanium and tantalum, a gas inlet for supplying nitrogen gas to the vacuum chamber, and a non-evaporable getter pump for serving as the primary pumping means in the vacuum chamber during the reactive physical vapor deposition of a nitride of the metal onto the substrate. The non-evaporable getter pump consists of a material insensitive to nitrogen, such as an alloy of zirconium and iron.

REFERENCES:
patent: 3536418 (1970-10-01), Breaux
patent: 4306887 (1981-12-01), Barosi et al.
patent: 4488506 (1984-12-01), Heinecke et al.
patent: 4599869 (1986-07-01), Ozin et al.
patent: 5238469 (1993-08-01), Briesacher et al.
SAES Getters--SORB-AC Getter Wafer Modules and Panels.
SAES Getters--St 101 Non-Evaporable Getters.
SAES Getters--SAES Getters Group Bulletin--Mar. '93 No. 3.
SORB-AC Appendage Getter Pumps--SAES Getters.
SAES Vacuum Gauge--Wide Range Spinning Rotor Gauge.
Capacittor--New High Capacity Non-Evaporable Getter Pump.

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