Reactive microgel and photosensitive resin composition containin

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C08F26900

Patent

active

055456944

ABSTRACT:
A reactive microgel suitable for a photosensitive resin composition for a water-developable flexographic printing plate, which has an average particle diameter of 1 to 10 .mu.m, and is formed of
microgel particles, as a core, synthesized from an acrylic monomer in an aqueous medium in the presence of an oil-soluble initiator and in the presence of a reactive polymer emulsifier which is an adduct of a neutralized product of an acrylic copolymer having a tertiary amino group with a compound having an epoxy group and an .alpha.,.beta.-unsaturated double bond, and a nonionic emulsifier having an HLB of 12 to 16, and
a compound having an epoxy group and an .alpha.,.beta.-unsaturated double bond, attached to surfaces of the microgel particles.

REFERENCES:
patent: 5120796 (1992-06-01), Fukuchi
Patent Abstracts of Japan; JP5032743, Feb. 9, 1993; abstract.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Reactive microgel and photosensitive resin composition containin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reactive microgel and photosensitive resin composition containin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reactive microgel and photosensitive resin composition containin will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1048505

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.