Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Patent
1995-06-07
1997-06-03
Langel, Wayne
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
423219, 423230, 423236, 423240S, 4232451, 423246, C01B 1300, C01B 3118, C01B 3120
Patent
active
056351488
ABSTRACT:
A reactive membrane for removing impurities, such as water, oxygen and organic compounds, from a gas is provided. The reactive membrane includes a porous inorganic substrate having exposed surfaces and at least one carbon layer, which is modified to present active sites, deposited on the exposed surfaces. The active sites include metal species which are at least partially deoxygenated and are chemically bonded to the carbon layer. Methods of forming the reactive membrane and of removing impurities from a gas with the membrane are also provided.
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Arizona Board of Regents on Behalf of the University of Arizona
Langel Wayne
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