Reactive matrix for removing impurities from hydride and inert g

Details Reactive matrix for removing impurities from hydride and inert g Reactive matrix for removing impurities from hydride and inert g

1992-09-10

1994-08-23

Lewis, Michael

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

423219, 423223, 423240R, 5253332, 5253282, 5253272, 525357, 525366, 549272, 549277, C01B 356, C08F 600

Patent

active

053405528

ABSTRACT:
A macroreticulate polymer is provided for removing water vapor and oxidants from a gas having the formula: ##STR1## wherein Ar is a heteroaromatic moiety, M is bonded to the heteroaromatic moiety and is selected from the group consisting of lithium, sodium, potassium, alkyl magnesium, alkyl zinc, and dialkylaluminum, R is an organic moiety and R.sub.1 is a polymerized moiety forming the molecular backbone of said polymer.

REFERENCES:
patent: 4070286 (1978-01-01), Iler et al.
patent: 4286068 (1981-08-01), Mares et al.
patent: 4455288 (1984-06-01), Salter et al.
patent: 4603148 (1986-07-01), Tom
patent: 4741780 (1988-05-01), Atkinson
patent: 4909852 (1990-03-01), Atkinson
Advanced Organic Chemistry, 3rd ed. New York, Plenum Press, 1990. pp. 370-371. QD251.2C36 1990.

Affiliated with

Also associated with

Rating

Reactive matrix for removing impurities from hydride and inert g does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reactive matrix for removing impurities from hydride and inert g, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reactive matrix for removing impurities from hydride and inert g will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-501058