Reactive ion etching of soft-magnetic substrates

Details Reactive ion etching of soft-magnetic substrates Reactive ion etching of soft-magnetic substrates

1983-02-02

1984-03-27

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204163R, C23C 1500

Patent

active

044392940

ABSTRACT:
A method of providing grooves in a body of a soft-magnetic, iron-containing material. The method includes reactive ion etching the body in a chlorine-containing or bromine-containing plasma after providing the body areas not to be etched with a mask of an inorganic material such as Al.sub.2 O.sub.3.

REFERENCES:
patent: 4016062 (1977-04-01), Mehta et al.
patent: 4226691 (1980-10-01), Cunningham
patent: 4238277 (1980-12-01), Bril et al.
patent: 4295924 (1981-10-01), Garnache et al.
patent: 4299680 (1981-11-01), Fontana et al.
patent: 4375390 (1983-03-01), Anderson et al.
Chang et al., IBM Research Disclosure Bull.; 14 (1972), p. 249.

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