Reactive ion etching apparatus

Details Reactive ion etching apparatus Reactive ion etching apparatus

1995-12-27

1997-10-28

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

216 71, 118723E, H01L 21302

Patent

active

056814194

ABSTRACT:
A reactive ion etching apparatus comprises a reactive chamber, an upper anode plate, a lower cathode plate, a gas introducing system and a pumping system. The cathode plate is formed as a variable potential electrode. The variable potential electrode is a combination of a conductive material and a nonconductive material.

REFERENCES:
patent: 4983253 (1991-01-01), Wolfe et al.
patent: 5006760 (1991-04-01), Drake, Jr.
patent: 5215619 (1993-06-01), Cheng et al.
patent: 5443689 (1995-08-01), Kimura et al.

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