Reactive gas sample introduction system for an inductively coupl

Details Reactive gas sample introduction system for an inductively coupl Reactive gas sample introduction system for an inductively coupl

1988-09-09

1990-05-15

Paschall, M. H.

Electric heating

Metal heating

By arc

2191215, 21912151, 21912152, 31511151, B23K 900

Patent

active

049260219

ABSTRACT:
A torch device is provided for use in preparing a sample of a gas or vapor for analysis by an analyzer. The torch device is comprised of an elongated cylindrical body with an inductively coupled plasma generating device located at its output or forward section. The torch includes a first tubular element for separately feeding a sample of reactive gas or vapor into a mixing chamber located rearward of said plasma generating means, a second tubular element for separately feeding a nabulizer flow of a plasma gas and including water or solvent vapor or aerosol thereof into the mixing chamber to thereby mix with said sample, and a third tubular element for maintaining a first sheath of plasma gas concentrically about the sample mixture as it enters the plasma generating device for dissociation therein by a plasma flame, including a fourth tubular element for maintaining a second sheath of plasma gas around the first sheath as a coolant prior to introduction of ions formed by dissociation into the analyzer.

REFERENCES:
patent: Re29304 (1977-07-01), Greenfield et al.
patent: 3296410 (1967-01-01), Hedger
patent: 4551609 (1985-11-01), Falk
patent: 4578560 (1986-03-01), Tanaka et al.
patent: 4665296 (1987-05-01), Iwata et al.
patent: 4739147 (1988-04-01), Meyer et al.

Affiliated with

Also associated with

Rating

Reactive gas sample introduction system for an inductively coupl does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reactive gas sample introduction system for an inductively coupl, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reactive gas sample introduction system for an inductively coupl will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-622711