Reaction system modifier suitable for use in the productions of

Details Reaction system modifier suitable for use in the productions of Reaction system modifier suitable for use in the productions of

1991-01-25

1992-06-02

Henderson, Christopher

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

At least one aryl ring which is part of a fused or bridged...

526287, C08J 300, C08F22802

Patent

active

051187566

ABSTRACT:
When obtaining microcapusles by covering a hydrophobic material with an aminoaldehyde polycondensation product as a wall-forming material in an acidic aqueous medium containing an anionic water-soluble polymer, a microcapsule slurry having a high solid content and low viscosity can be obtained by using as the anionic water-soluble polymer a multi-component copolymer consisting as essential monomer components thereof of at least three types of acrylic monomers selected respectively from (A) acrylic acid and/or methacrylic acid, (B) acrylonitrile and/or methacrylonitrile and (C) an acrylamidoalkylsulfonic acid and/or sulfoalkyl acrylate. Over a wide pH range, the microcapsule slurry obtained in accordance with this invention undergoes little viscosity changes and exhibits neither destruction of its dispersed state nor coagulating tendency. Resulting microcapsules have a sharp particle size distribution and are equipped with dense wall films.

REFERENCES:
patent: 4221710 (1980-09-01), Hoshi et al.
patent: 4373056 (1983-02-01), Besecke
patent: 4406816 (1983-09-01), Sliwka

Affiliated with

Also associated with

Rating

Reaction system modifier suitable for use in the productions of does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reaction system modifier suitable for use in the productions of , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reaction system modifier suitable for use in the productions of will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2229194