Reaction system for growing a thin film

Details Reaction system for growing a thin film Reaction system for growing a thin film

2006-04-04

2006-04-04

Gravini, S. (Department: 3749)

Drying and gas or vapor contact with solids

Process

With fluid current conveying or suspension of treated material

C034S391000, C034S072000, C034S107000, C034S202000, C438S785000, C118S715000

Reexamination Certificate

active

07020981

ABSTRACT:
A reactor defines a reaction chamber for processing a substrate. The reactor comprises a first inlet for providing a first reactant and to the reaction chamber and a second inlet for a second reactant to the reaction chamber. A first exhaust outlet removes gases from the reaction chamber. A second exhaust outlet removes gases from the reaction chamber. A flow control system is configured to alternately constrict flow through the first and second exhaust outlets. The reactor chamber is configured to for a diffusion barrier within the reaction chamber.

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