Reaction enhancing gas feed for injecting gas into a plasma...

Details Reaction enhancing gas feed for injecting gas into a plasma... Reaction enhancing gas feed for injecting gas into a plasma...

2003-01-31

2008-12-23

Paschall, Mark (Department: 3742)

Electric heating

Metal heating

By arc

C219S121430, C219S121410, C118S7230AN, C156S345330, C156S345290

Reexamination Certificate

active

07468494

ABSTRACT:
In one aspect of the invention is a gas feed for injecting gas into a plasma-processing chamber that reduces the speed at which the gas interacts with the plasma discharge, so enhancing the stability of the plasma and the production of reaction products. In one embodiment, the gas feed comprises a gas speed reducer having apertures along its wall through which gas is distributed into the plasma chamber at a tangent to the chamber walls. In another embodiment, the gas feed comprises a gas speed reducer, which is made up of one or more channels such that, when traveling through the channels, the input and the output holes of the channels can only be connected by a broken line. In yet another embodiment, the gas speed reducer has a plurality of perforated sheaths, such that holes on one perforated sheath are not aligned with holes on another perforated sheath.

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patent: 401054115 (1989-03-01), None

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