Reaction container for deposition of elemental silicon

Details Reaction container for deposition of elemental silicon Reaction container for deposition of elemental silicon

1976-04-21

1977-05-17

Kaplan, Morris

Coating apparatus

With vacuum or fluid pressure chamber

118 49, C23C 1308

Patent

active

040235203

ABSTRACT:
A non-contaminating thermal stress-free reaction container for thermal deposition of elemental silicon comprised of a base plate and a tubular member placed thereon which has at least the side walls of the container composed of pure silicon.

REFERENCES:
patent: 3293074 (1966-12-01), Nickl
patent: 3340848 (1967-09-01), Kersting
patent: 3367303 (1968-02-01), Bostic et al.
patent: 3372671 (1968-03-01), Chu
patent: 3492969 (1970-02-01), Emeis
patent: 3705567 (1972-12-01), Emeis
patent: 3746496 (1973-07-01), Dietz et al.
patent: 3757071 (1977-09-01), Stut
patent: 3820935 (1974-06-01), Dietze
patent: 3918396 (1975-11-01), Dietze et al.
patent: 3919968 (1975-11-01), Sandmann et al.

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