Reaction chamber with controlled radiant energy heating and dist

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...

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118725, 118730, 437233, 437243, 437925, 437963, 4272481, B01J 1908, B01J 1912

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active

051568209

ABSTRACT:
A reaction chamber for a controlled reaction on a reaction surface of a sample provides for controlled distribution of radiant energy over the reaction surface to offset radiant heat loss of the sample, and establishes uniform distribution of reactant flow on the sample. A lamp housing supplies radiant energy over the sample, which absorbs at least a component of the radiant energy. A support member which supports the sample within the reaction chamber is formed of a material which is essentially transparent to the radiant energy so that it does not behave as a susceptor. An array of lamps, is mounted with the reaction chamber so that direct radiant energy is transmitted through a window to the reaction surface of the sample. A reflecting surface on the housing includes a lamp seat for each lamp in the array with an individually specified position, curvature and tilt with respect to the reaction surface. A source of reactant gas is coupled through a gas port to the reaction chamber between the window and the reaction surface. A reactant distribution plate is mounted between the gas port and the reaction surface, and causes distributed flow of reactant gas over the reaction surface. The distribution plate includes a plurality of perforations having a pattern which determines the distribution of reactant gas flow.

REFERENCES:
patent: 3916822 (1975-11-01), Robinson
patent: 4421786 (1983-12-01), Mahajan et al.
patent: 4496609 (1985-01-01), McNeilly et al.
patent: 4533820 (1985-08-01), Shimizu
patent: 4654509 (1987-03-01), Robinson et al.
patent: 4680451 (1987-07-01), Gat et al.
patent: 4755654 (1988-07-01), Crowley et al.
patent: 4789771 (1988-12-01), Robinson et al.
patent: 4798165 (1989-01-01), de Boer et al.
patent: 4800105 (1989-01-01), Nakayama et al.
patent: 4823735 (1989-04-01), Pichel et al.
Van Pul et al., Manufacturing Methods, Techniques and Automated Controls for the Continuous Epitaxial Processing of Silicon Integrated Circuits, vol. 1, Technical Report AFML-TR-78-47, May, 1978, Motorola, Inc.

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