Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
Patent
1989-05-15
1992-10-20
Eldred, J. Woodrow
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
With means applying electromagnetic wave energy or...
118725, 118730, 437233, 437243, 437925, 437963, 4272481, B01J 1908, B01J 1912
Patent
active
051568209
ABSTRACT:
A reaction chamber for a controlled reaction on a reaction surface of a sample provides for controlled distribution of radiant energy over the reaction surface to offset radiant heat loss of the sample, and establishes uniform distribution of reactant flow on the sample. A lamp housing supplies radiant energy over the sample, which absorbs at least a component of the radiant energy. A support member which supports the sample within the reaction chamber is formed of a material which is essentially transparent to the radiant energy so that it does not behave as a susceptor. An array of lamps, is mounted with the reaction chamber so that direct radiant energy is transmitted through a window to the reaction surface of the sample. A reflecting surface on the housing includes a lamp seat for each lamp in the array with an individually specified position, curvature and tilt with respect to the reaction surface. A source of reactant gas is coupled through a gas port to the reaction chamber between the window and the reaction surface. A reactant distribution plate is mounted between the gas port and the reaction surface, and causes distributed flow of reactant gas over the reaction surface. The distribution plate includes a plurality of perforations having a pattern which determines the distribution of reactant gas flow.
REFERENCES:
patent: 3916822 (1975-11-01), Robinson
patent: 4421786 (1983-12-01), Mahajan et al.
patent: 4496609 (1985-01-01), McNeilly et al.
patent: 4533820 (1985-08-01), Shimizu
patent: 4654509 (1987-03-01), Robinson et al.
patent: 4680451 (1987-07-01), Gat et al.
patent: 4755654 (1988-07-01), Crowley et al.
patent: 4789771 (1988-12-01), Robinson et al.
patent: 4798165 (1989-01-01), de Boer et al.
patent: 4800105 (1989-01-01), Nakayama et al.
patent: 4823735 (1989-04-01), Pichel et al.
Van Pul et al., Manufacturing Methods, Techniques and Automated Controls for the Continuous Epitaxial Processing of Silicon Integrated Circuits, vol. 1, Technical Report AFML-TR-78-47, May, 1978, Motorola, Inc.
Ku Yen-Hui
Wong Fred
Eldred J. Woodrow
Rapro Technology, Inc.
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