Reaction chamber having in situ oxygen generation

Details Reaction chamber having in situ oxygen generation Reaction chamber having in situ oxygen generation

1995-05-25

1997-03-18

Valentine, Donald R.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204265, 204266, 204277, 204278, 118723R, 118723MP, 118724, C25B 900, C23C 1600

Patent

active

056118988

ABSTRACT:
The present invention encompasses a semiconductor processing device having a processing chamber in which is positioned an electrolyte oxygen pump assembly and tubing for transferring an oxygen containing gas from outside the reaction chamber to within the interior of the electrolyte oxygen pump assembly and tubing for removal of the oxygen depleted gas from within the interior of the electrolyte oxygen pump assembly. In addition, the semiconductor processing tool may further have heating elements for heating a semiconductor substrate within the processing chamber independently from heating of the electrolyte.

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