Reacting device

Details Reacting device Reacting device

2006-09-06

2011-10-18

Neckel, Alexa D. (Department: 1723)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Including heat exchanger for reaction chamber or reactants...

C422S198000, C422S200000, C422S187000, C422S198000, C422S186220, C422S198000, C048S127900, C048S094000, C048S095000, C048S128000, C048S118500

Reexamination Certificate

active

08038959

ABSTRACT:
A reacting device includes a base plate, a first reaction unit provided on the base plate, a reaction material being supplied thereto, the first reaction unit being set at a first temperature, a reaction flow channel being formed such that the reaction material flows therein, the first reaction unit causing a reaction of the reaction material and at least one heating unit which sets the first reaction unit at the first temperature. The first reaction unit has a plurality of reactors that communicate with each other, and the heating unit is provided between the adjacent reactors.

REFERENCES:
patent: 5270127 (1993-12-01), Koga et al.
patent: 6159434 (2000-12-01), Gonjo et al.
patent: 6923625 (2005-08-01), Sparks
patent: 7090807 (2006-08-01), Brauchle et al.
patent: 7572417 (2009-08-01), Miyamoto et al.
patent: 7662349 (2010-02-01), Miyamoto et al.
patent: 2002/0071797 (2002-06-01), Loffler et al.
patent: 2002/0176813 (2002-11-01), Erdman
patent: 2004/0005268 (2004-01-01), Bruck et al.
patent: 2004/0191591 (2004-09-01), Yamamoto
patent: 2004/0244290 (2004-12-01), Yamamoto et al.
patent: 2005/0191534 (2005-09-01), Kim et al.
patent: 2006/0210846 (2006-09-01), Isozaki et al.
patent: 2007/0144961 (2007-06-01), Tani et al.
patent: 2007/0217970 (2007-09-01), Saito et al.
patent: 1276346 (2000-12-01), None
patent: 60-040715 (1986-09-01), None
patent: 62-167203 (1987-07-01), None
patent: 10-245573 (1998-09-01), None
patent: 11-326037 (1999-11-01), None
patent: 2000-120996 (2000-04-01), None
patent: 2000-513690 (2000-10-01), None
patent: 2001-009937 (2001-01-01), None
patent: 2001-089105 (2001-04-01), None
patent: 2001-146401 (2001-05-01), None
patent: 2002-053306 (2002-02-01), None
patent: 2002-511383 (2002-04-01), None
patent: 2002-249139 (2002-09-01), None
patent: 2002-356310 (2002-12-01), None
patent: 2003-089502 (2003-03-01), None
patent: 2003-089504 (2003-03-01), None
patent: 2003-171101 (2003-06-01), None
patent: 2003-300703 (2003-10-01), None
patent: 2004-296349 (2004-10-01), None
patent: 2004-303695 (2004-10-01), None
patent: 2004-331434 (2004-11-01), None
patent: 2005-009553 (2005-01-01), None
patent: 2005-132712 (2005-05-01), None
patent: 2003-0044346 (2003-06-01), None
patent: WO 99/29621 (1999-06-01), None
patent: WO 2004/094044 (2004-11-01), None
Olsen, John C., “Unit Processes and Principles of Chemical Engineering”, Jul. 5, 1932, D. Van Nostrand Company, Inc., Chapter I, pp. 1-3.
Chinese Office Action (and English translation thereof) dated Jan. 4, 2008, issued in a counterpart Chinese Application.
Japanese Office Action dated Jan. 13, 2009 (2 pages), and English translation thereof (2 pages) issued in counterpart Japanese Application No. 2005-260599.
Japanese Office Action dated Jan. 13, 2009 (2 pages), and English translation thereof (2 pages) issued in counterpart Japanese Application No. 2005-260586.
Japanese Office Action dated Jan. 13, 2009 (2 pages), and English translation thereof (2 pages) issued in counterpart Japanese Application No. 2005-260514.
Korean Office Action dated Aug. 28, 2007 and English translation thereof in counterpart Korean Application No. 2006-0086062.
U.S. Appl. No. 11/513,486, filed: Aug. 31, 2006.
U.S. Appl. No. 11/529,685, filed: Sep. 28, 2006.
U.S. Appl. No. 11/716,875, filed: Mar. 12, 2007.
Japanese Office Action dated Jan. 27, 2009 (3 pages), and English translation thereof (4 pages) issued in counterpart Japanese Application No. 2005-284493 of related U.S. Appl. No. 11/529,685.
Japanese Office Action dated Jan. 27, 2009 (2 pages), and English translation thereof (3 pages) issued in counterpart Japanese Application No. 2005-284700 of related U.S. Appl. No. 11/529,685.
Japanese Office Action dated Jan. 27, 2009 (2 pages), and English translation thereof (3 pages), issued in counterpart Japanese Application No. 2005-284582 of related U.S. Appl. No. 11/529,685.
Chinese Office Action dated Apr. 4, 2008 (4 pages), and English translation thereof (2 pages), issued in a counterpart Chinese Application of related U.S. Appl. No. 11/529,685.
Japanese Office Action dated Aug. 15, 2008 (3 pages), and English translation thereof (7 pages), issued in counterpart Japanese Application of related U.S. Appl. No. 11/513,486.
Japanese Office Action dated Jun. 1, 2010 (3 pages) and English translation thereof (5 pages) in counterpart Japanese Application No. 2006-069480 of related U.S. Appl. No. 11/716,875.
Chinese Office Action dated Dec. 5, 2008 (4 pages) and English translation thereof (2 pages) issued in counterpart Chinese application No. 2007100876824 of related U.S. Appl. No. 11/716,875.

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