Fluid sprinkling – spraying – and diffusing – With heating or cooling means for the system or system fluid – In terminal element
Patent
1997-10-10
1999-09-14
Weldon, Kevin
Fluid sprinkling, spraying, and diffusing
With heating or cooling means for the system or system fluid
In terminal element
239139, 239428, 239432, 118715, C23C 1600
Patent
active
059509252
ABSTRACT:
A reactant gas ejector head enables a process gas mixture of a uniform concentration and composition to be delivered to the surface of a substrate in a stable and uniform thermodynamic state by preventing premature reactions to occur along the gas delivery route. The reactant gas ejector head comprises an ejection head body having a back plate and a nozzle plate for defining a gas mixing space therebetween. The nozzle plate has numerous gas ejection nozzles. A gas supply pipe is communicated with the ejection head body through a center region of the back plate so as to separately introduce at least two types of gaseous substances into the mixing space. Gas distribution passages are formed between the back plate and the nozzle plate in such a way as to guide the at least two types of gaseous substances from the gas supply pipe to be directed separately towards peripheral regions of the gas mixing space.
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Copending U.S. Patent Application filed Apr. 19, 1996 entitled "Thin-Film Vapor Deposition Apparatus", by Noriyuki Takeuchi, Serial No. 08/634,847.
Fukunaga Yukio
Saitoh Masao
Shinozaki Hiroyuki
Tsukamoto Kiwamu
Ebara Corporation
Weldon Kevin
LandOfFree
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