Reactant exhaust system for a thermal processing furnace

Details Reactant exhaust system for a thermal processing furnace Reactant exhaust system for a thermal processing furnace

1989-06-28

1991-02-12

Bennet, Henry A.

Heating

Accessory means for holding, shielding or supporting work...

432152, 432241, 118715, F27D 500, F27D 702

Patent

active

049920448

ABSTRACT:
A furnace used for high-temperature processing of semiconductor wafers employs a scavenger arrangement for removing effluent reactant gases which provides radial symmetry of gas flow. A scavenger chamber surrounds one end of a cylindrical furnace, and draws exhaust gases outward by a pressure differential. The scavenger chamber has a cylindrical quartz liner having a number of openings therein, the openings being circumferentially spaced about the end of the furnace so that gas flow is uniform and symmetrical. Preferably, these openings are in a plurality of groups, spaced from one another.

REFERENCES:
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patent: 4375027 (1983-02-01), Zeto et al.
patent: 4401254 (1983-08-01), Tramontini
patent: 4411619 (1983-10-01), Darnell et al.
patent: 4459104 (1984-07-01), Wollman
patent: 4526534 (1983-07-01), Wollman
patent: 4543059 (1985-09-01), Whang et al.
patent: 4711197 (1987-12-01), Taylor, Sr.

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