Raw material feeding device, film formation system and...

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S248100

Reexamination Certificate

active

08029621

ABSTRACT:
A raw material feeding device for feeding a gaseous raw material formed by sublimating a solid raw material to a film formation system includes a raw material container for holding the solid raw material therein, a first heating unit placed at a first side of the container, a second heating unit placed at a second side thereof, the first temperature control unit for conducting a first process of controlling the first and the second heating unit to make the temperature of the first side higher than that of the second side to thereby sublimate the solid raw material disposed at the first side, and the second temperature control unit for conducting a second process of controlling the first and the second heating unit to make the temperature of the second side higher than that of the first side to thereby sublimate the solid raw material disposed at the second side.

REFERENCES:
patent: 3925146 (1975-12-01), Olsen et al.
patent: 4911101 (1990-03-01), Ballingall, III et al.
patent: 2003/0101937 (2003-06-01), Van Slyke et al.
patent: 2005/0011448 (2005-01-01), Iwata
patent: 63 297295 (1988-12-01), None
patent: 5-311446 (1993-11-01), None
patent: 8 167575 (1996-06-01), None
patent: 2004 140328 (2004-05-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Raw material feeding device, film formation system and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Raw material feeding device, film formation system and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Raw material feeding device, film formation system and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4277569

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.