Ratiometric autotuning algorithm for RF plasma generator

Details Ratiometric autotuning algorithm for RF plasma generator Ratiometric autotuning algorithm for RF plasma generator

1998-02-09

2000-02-01

Gensler, Paul

Wave transmission lines and networks

Automatically controlled systems

333 173, H03H 700

Patent

active

060207949

ABSTRACT:
An RF plasma system employs frequency tuning to change the frequency of an RF generator within a frequency range to match the impedance of a plasma chamber. Forward power and reflected power magnitudes are obtained from a bidirectional sensor. The ratio of reflected power to forward power is obtained for one frequency, and then the frequency is changed. The tuning algorithm compares the ratio of reflected to forward power at the new frequency with the ratio obtained earlier. If this ratio is smaller, the frequency is changed again in the same direction, but if larger, then the frequency is changed in the other direction. These steps are iterated until the ratio of reflected to forward power reaches a minimum. The tuning algorithm can be implemented in hardware or in software.

REFERENCES:
patent: 4375051 (1983-02-01), Theall
patent: 4679007 (1987-07-01), Reese et al.
patent: 5441596 (1995-08-01), Nulty
patent: 5688357 (1997-11-01), Hanawa

Affiliated with

Also associated with

Rating

Ratiometric autotuning algorithm for RF plasma generator does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ratiometric autotuning algorithm for RF plasma generator, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ratiometric autotuning algorithm for RF plasma generator will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-940852