Raster scanning system utilizing overfilled polygon facet design

Facsimile and static presentation processing – Facsimile – Specific signal processing circuitry

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350 67, 358206, G02B 2608, H04N 308

Patent

active

049781855

ABSTRACT:
An overfilled polygon scanning system is implemented by first determining which portions of the polygon facet can be formed with a degree of flatness within specification. Typically, the flatness goes increasingly out of specification to the facet edges, causing stray light and subsequent reduction in contrast in a subsequent exposure at a photoreceptor image plane. Once the areas of the outside specification portions are determined, these areas which constitute the oversized portion of the polygon are coated with a non-reflective material. This coating eliminates light reflected from these areas and assures that the light is reflected only along the non-coated (within specification) portion of each facet.

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