Raster-scan photolithographic reduction system

Details Raster-scan photolithographic reduction system Raster-scan photolithographic reduction system

1997-09-30

1999-11-09

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, 355 71, G03B 2742, G03B 2772

Patent

active

059824751

ABSTRACT:
A reduction photolithographic scanning system uses a reduction lens with a circular image field that is shaped to an irregular hexagonal configuration affording different effective scanning widths so that the full area of a microcircuit image can be scanned onto a substrate in an integer number of overlapping scans. This minimizes the number of scans required for each image area and maximizes the total image area that can be scanned per time unit.

REFERENCES:
patent: 3762821 (1973-10-01), Bruning et al.
patent: 4701608 (1987-10-01), Morita et al.
patent: 4703166 (1987-10-01), Bruning
patent: 4748477 (1988-05-01), Isohata et al.
patent: 4749867 (1988-06-01), Matsushita et al.
patent: 4773750 (1988-09-01), Bruning
patent: 4825086 (1989-04-01), Mueller
patent: 4883352 (1989-11-01), Bruning
patent: 4924257 (1990-05-01), Jain
patent: 5281996 (1994-01-01), Bruning et al.
patent: 5285236 (1994-02-01), Jain
patent: 5291240 (1994-03-01), Jain
patent: 5473408 (1995-12-01), Hoffman et al.
patent: 5473410 (1995-12-01), Nishi
patent: 5579147 (1996-11-01), Mori et al.
patent: 5650877 (1997-07-01), Phillips, Jr. et al.
patent: 5710619 (1998-01-01), Jain et al.
"Evaluation of Effect of Scanning on the resolution of Optical Systems" by G.N. Buinov & N. Yu. Kontievskaya Sov. J. Opt. Technol. 48(9), Sep. 1981, pp. 566-567.
"Optical Fabrication Rises to the 193-nm Challenge" by James Webb and John Nemechek, Laser Focus'World, Feb. 1997, pp. 75-82.
"Optical Lithography--Thirty Years and Three orders of Magnitude" by John Bruning, Reprinted from Emerging Lithographic Technologies, vol. 3048, Mar. 10-11, 1997-Society of Photo-Optical Instrumentation Engineers, pp. 14-27.

Affiliated with

Also associated with

Rating

Raster-scan photolithographic reduction system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Raster-scan photolithographic reduction system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Raster-scan photolithographic reduction system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1463718