Rapid thermal processor for heating a substrate

Details Rapid thermal processor for heating a substrate Rapid thermal processor for heating a substrate

1999-01-08

2000-07-18

Walberg, Teresa

Electric resistance heating devices

Heating devices

Radiant heater

118728, 118500, 219390, A21B 200

Patent

active

060918896

ABSTRACT:
A planar inverted-cone susceptor, preferably made of silicon carbide, inversely disposed between a substrate and a holder of the Rapid Thermal Processor (RTP) so as to perform heat compensation on the substrate. Because the substrate is directly supported by the inverted-cone susceptor, heat stored in the wafer can be rapidly received by the inverted-cone susceptor. Thermal stress and thermal gradient can be effectively decreased in the wafer.

REFERENCES:
patent: 5418885 (1995-05-01), Hauser et al.
patent: 5683518 (1997-11-01), Moore et al.
patent: 5820686 (1998-10-01), Moore
patent: 5841110 (1998-11-01), Nenyei et al.
patent: 5926615 (1999-07-01), Hwu et al.

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