Rapid thermal processing barrel reactor for processing substrate

Details Rapid thermal processing barrel reactor for processing substrate Rapid thermal processing barrel reactor for processing substrate

1997-02-25

2000-08-29

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118724, 118728, 118730, 118666, 219390, 219391, 219406, 219411, 392407, 392411, 392416, 392418, 432 9, 432200, 432202, 4322542, 4272481, C23C 1600, F27B 500, F27B 514, F27B 518

Patent

active

06110289&

ABSTRACT:
A novel rapid thermal process (RTP) barrel reactor processes a larger batch of semiconductor substrates than was previously possible. The RTP barrel reactor is characterized by a short process cycle time in comparison to the same process cycle time in a conventional CVD barrel reactor. A rapid heat-up of the substrates is one of the keys to the shorter process cycle times of the RTP barrel reactor. The RTP barrel reactor utilizes a radiant heat source in combination with a heat controller that includes an open-loop controller for heat-up and a closed-loop controller for deposition as well as a new energy stabilizer to achieve heating a larger energy stabilizer and volume to a uniform processing temperature in times characteristic of RTP reactors.

REFERENCES:
patent: Re33326 (1990-09-01), Ebata et al.
patent: 3796182 (1974-03-01), Rosler
patent: 4081313 (1978-03-01), McNeilly et al.
patent: 4496609 (1985-01-01), McNeilly et al.
patent: 4823736 (1989-04-01), Post et al.
patent: 4858557 (1989-08-01), Pozzetti et al.
patent: 5053247 (1991-10-01), Moore
patent: 5207835 (1993-05-01), Moore
patent: 5288364 (1994-02-01), Burt et al.
patent: 5444217 (1995-08-01), Moore et al.
patent: 5580388 (1996-12-01), Moore

Affiliated with

Also associated with

Rating

Rapid thermal processing barrel reactor for processing substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rapid thermal processing barrel reactor for processing substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rapid thermal processing barrel reactor for processing substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1245449