Rapid thermal processing apparatus and method of manufacture...

Details Rapid thermal processing apparatus and method of manufacture... Rapid thermal processing apparatus and method of manufacture...

2007-10-16

2007-10-16

Robinson, Daniel (Department: 3742)

Electric resistance heating devices

Heating devices

Radiant heater

C392S411000

Reexamination Certificate

active

11032087

ABSTRACT:
A rapid thermal processing apparatus comprises a processing chamber which subjects a semiconductor substrate to rapid thermal processing. A substrate support part is arranged in the processing chamber and supports the substrate. A lamp part optically irradiates the substrate supported by the substrate support part and heats the substrate. A thermo sensor is provided to measure a temperature of the substrate. A temperature computing part computes the temperature of the substrate based on an output signal of the thermo sensor. A control part controls an irradiation intensity of the lamp part according to the temperature computed by the temperature computing part. In this apparatus, the control part is provided to correct a control parameter of the irradiation intensity of the lamp part based on a measured reflectivity of a surface of the substrate.

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patent: 6529686 (2003-03-01), Ramanan et al.
patent: 2004/0105670 (2004-06-01), Kusuda et al.

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