Rapid thermal process for obtaining silica coatings

Details Rapid thermal process for obtaining silica coatings Rapid thermal process for obtaining silica coatings

1990-06-18

1991-10-22

Beck, Shrive

Coating processes

Electrical product produced

Welding electrode

427 541, 427 55, 4271262, 4271263, 4271264, 437238, 437235, B05D 306, B05D 512, H01L 212

Patent

active

050594486

ABSTRACT:
The present invention is based on the discovery that rapid thermal processing (RTP) can convert hydrogen silsesquioxane resin coatings to ceramic silica coatings. This technique is especially valuable for the application of protective and dielectric layers on electronic devices.

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Singh, J. Appl. Phys., 63(8) R59-R114 (1988), "Renal Isothermal Processor".
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Semiconductor International, Sep. 1989, p. 26, "British Study Effects of RTA on Processor on CMOS Devices", no author.
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Wilson et al., Mat. Res. Soc. Symp. Proc., vol. 52 (1986).
Singer, Semiconductor International, Mar. 1989.
Leavitt, Semiconductor International Mar. 1987, "Rapid Thermal Processing".
AG Associates, Solid State Technol, Nov. 1989, pp. 55-56, no author.

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