Rapid thermal annealing of TFEL panels

Details Rapid thermal annealing of TFEL panels Rapid thermal annealing of TFEL panels

1988-09-27

1990-02-13

Nguyen, Nam X.

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

427 64, 313503, B05D 506, B05D 512

Patent

active

049005847

ABSTRACT:
A process for fabrication and annealing of TFEL panels includes the steps of depositing a laminar stack of thin films on a glass substrate containing a first set of electrodes, the laminar stack comprising at least one insulating layer and an EL phosphor layer and annealing the laminar stack under an array of high intensity flash lamps at a temperature exceeding 450.degree. C. for a period of between 15 and 240 seconds. The flash lamps bring the temperature of the laminar stack to the required high temperature very quickly and the stack is cooled very quickly at the end of the annealing period. This process conditions the EL phosphor layer but does not warp the glass substrate or damage the thin films.

REFERENCES:
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patent: 3854070 (1974-12-01), Vlasenko et al.
patent: 4099091 (1978-07-01), Yamazoe et al.
patent: 4155030 (1979-05-01), Chang
patent: 4442136 (1984-04-01), Johnson
patent: 4508610 (1985-04-01), Freeman et al.
patent: 4552782 (1985-11-01), Cattell et al.
Heat Pulse.TM. 410/610, AG Associates.
H. Venghans et al., "Microstructure . . . Devices", J. Appl. Physics, vol. 53, No. 6, 6/82, pp. 4146-4157.

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