Rapid thermal anneal system and method including improved temper

Details Rapid thermal anneal system and method including improved temper Rapid thermal anneal system and method including improved temper

1997-08-06

2000-03-28

Jeffery, John A.

Electric resistance heating devices

Heating devices

Radiant heater

118725, 374124, H01L 2131, G01J 506

Patent

active

060442034

ABSTRACT:
A broadband pyrometer is used for sensing temperature of a semiconductor wafer in an RTA system in association with a monochromator to cancel the backside characteristics of the semiconductor wafer. A rapid thermal anneal (RTA) system includes a rapid thermal anneal (RTA) chamber, a heating lamp arranged in the vicinity of the RTA chamber for heating interior to the RTA chamber, a broadband pyrometer disposed in the vicinity of the RTA chamber and directed to measure interior to the RTA chamber, and a grating monochromator connected to the broadband pyrometer.

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