Rapid thermal anneal system and method including improved temper

Details Rapid thermal anneal system and method including improved temper Rapid thermal anneal system and method including improved temper

1996-07-26

1998-02-03

Dutton, Brian

Fishing, trapping, and vermin destroying

437247, 356 45, 356328, 37124, 37130, G01R 3126, H01L 2166, H01L 21324, H01L 21477

Patent

active

057143927

ABSTRACT:
A broadband pyrometer is used for sensing temperature of a semiconductor wafer in an RTA system in association with a monochromator to cancel the backside characteristics of the semiconductor wafer. A rapid thermal anneal (RTA) system includes a rapid thermal anneal (RTA) chamber, a heating lamp arranged in the vicinity of the RTA chamber for heating interior to the RTA chamber, a broadband pyrometer disposed in the vicinity of the RTA chamber and directed to measure interior to the RTA chamber, and a grating monochromator connected to the broadband pyrometer.

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