Optics: measuring and testing – Dimension – Thickness
Reexamination Certificate
2006-10-31
2006-10-31
Lee, Hwa (Andrew) (Department: 2877)
Optics: measuring and testing
Dimension
Thickness
C356S632000
Reexamination Certificate
active
07130062
ABSTRACT:
An electron-beam deposition system includes an evaporation source having a source target with a target location at which a deposition material may be positioned, and a controllable electron-beam source disposed to direct an electron beam at the target location. A trailing-indicator monitor measures a past evaporation performance of the evaporation source and has a trailing-indicator output, and a leading-indicator monitor measures a future evaporation performance of the evaporation source and has a leading-indicator output. A controller receives the trailing-indicator output and the leading-indicator output, and controls the electron-beam source responsive to the trailing-indicator output and to the leading-indicator output. Preferably, the trailing-indicator monitor measures a deposition of the deposition material on a monitored substrate, and the leading-indicator monitor measures a brightness of the deposition material in the evaporation source.
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Gabura Andrew James
Harris Geoffrey George
Lee Hwa (Andrew)
Punnoose Roy M.
Raytheon Company
Schubert William C.
Vick Karl A.
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