Rapid drying oven and methods for providing rapid drying of mult

Details Rapid drying oven and methods for providing rapid drying of mult Rapid drying oven and methods for providing rapid drying of mult

2000-03-22

2000-12-12

Gravini, Stephen

Drying and gas or vapor contact with solids

Process

Gas or vapor pressure is subatmospheric

34410, F26B 504

Patent

active

061581461

ABSTRACT:
A dryer for use with chemical compounds employs controlled vacuum, elevated temperature and dry, inert gas to dry the chemical compounds. The dryer includes a vacuum chamber into which trays containing the compounds are placed. The chamber includes heating elements which elevate the temperature of chemical samples placed within the chamber. Supplying and evacuating manifolds, each with a plurality of orifices for supplying and evacuating dry inert gas, provide a substantially laminar flow of dry inert gas just above the trays of chemical compounds which are to be dried. The laminar gas flow removes the unwanted vapor which tends to form above the tray of chemical compound, thus accelerating the drying process.

REFERENCES:
patent: 4597188 (1986-07-01), Trappler
patent: 5105557 (1992-04-01), Vadasz et al.
patent: 5250323 (1993-10-01), Miyazaki et al.
patent: 6038785 (2000-03-01), Lawson et al.

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